Zeiss UltraPlus analytical FESEM

Zeiss UltraPlus FESEM


 Dr Frank Brink
 +61 2 6125 6883


This FESEM is used for ultra high resolution application at low and high kV.

It is also used for electron back-scattered diffraction (EBSD), quantitative X-ray analysis, mapping, and variable pressure applications.


  • Five-axis motorised stage;
  • Turbo and ion pump vacuum system;
  • In-lens and below lens secondary electron detectors;
  • Angular sensitive backscatter detector (AsB);
  • Energy sensitive backscatter detector (EsB);
  • Gas injection needle for variable pressure/charge compensation;
  • Oxford Instruments INCA x-act EDXA system, 10mm2 Silicon Drift Detector (ATW, 129eV);
  • Oxford Instruments HKL EBSP; and an
  • IR Chamber scope


CLEM (correlative light and electron microscopy).

Electronic Backscatter Diffraction mapping


All new users receive one-on-one training.

Attending the Introduction to Scanning Electron Microscopy workshop will give users a deeper understanding of SEM and help users to improve the quality of their data.


Updated:  25 April 2018/Responsible Officer:  Director CAM/Page Contact:  CAM Web Admin