Zeiss UltraPlus analytical FESEM

Zeiss UltraPlus FESEM

Contact

 Dr Frank Brink
 +61 2 6125 6883

Specifications

This FESEM is used for ultra high resolution application at low and high kV.

It is also used for electron back-scattered diffraction (EBSD), quantitative X-ray analysis, mapping, and variable pressure applications.

Features on this instrument include:

  • Five-axis motorised stage;
  • Turbo and ion pump vacuum system;
  • In-lens and below lens secondary electron detectors;
  • Angular sensitive backscatter detector (AsB);
  • Energy sensitive backscatter detector (EsB);
  • Gas injection needle for variable pressure/charge compensation;
  • INCA Energy 450 EDXA system, 30mm2 Si(Li) EDS (ATW, 133eV);
  • Oxford HKL EBSP; and a
  • IR Chamber scope

Applications

CLEM (correlative light and electron microscopy).

 

Updated:  23 June 2017/Responsible Officer:  Director CAM/Page Contact:  CAM Web Admin