Cell explosion imaged on ZEISS UltraPlus SEM

Zeiss UltraPlus analytical FESEM

Ultra high resolution applications at low and high kV, EBSD, quantitative X-ray analysis, mapping, and variable pressure applications.

Contact

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Dr Frank Brink
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About

This FESEM is used for ultra high resolution application at low and high kV.

It is also used for electron back-scattered diffraction (EBSD), quantitative X-ray analysis, mapping, and variable pressure applications.

Features on this instrument include:

  • Five-axis motorised stage
  • Turbo and ion pump vacuum system
  • In-lens and below lens secondary electron detectors
  • Angular sensitive backscatter detector (AsB)
  • Energy sensitive backscatter detector (EsB)
  • Gas injection needle for variable pressure/charge compensation
  • Oxford Instruments INCA x-act EDXA system, 10mm2 Silicon Drift Detector (ATW, 129eV)
  • Oxford Instruments HKL EBSP
  • IR Chamber scope

Training

All new users receive one-on-one training.

Attending the Introduction to Scanning Electron Microscopy workshop will give users a deeper understanding of SEM and help users to improve the quality of their data.

Applications